Selected Area Electron Beam Induced Deposition of Pt and W for EBSD Backgrounds

被引：0
|
作者：
Osborn, William A. [1 ]
McLean, Mark J. [1 ]
Bush, Brian [1 ]
机构：
[1] NIST, Mat Measurement Sci Div, 100 Bur Dr,MS 8520, Gaithersburg, MD 20899 USA
来源：
MICROSCOPY AND MICROANALYSIS | 2019年 / 25卷 / 01期
关键词：
background; band contrast; EBSD; EBID; HR-EBSD;
D O I：
10.1017/S1431927618016173
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Applying high-resolution electron backscatter diffraction (HR-EBSD) to materials without regions that are amenable to the acquisition of backgrounds for static flat fielding (background subtraction) can cause analysis problems. To address this difficulty, the efficacy of electron beam induced deposition (EBID) of material as a source for an amorphous background signal is assessed and found to be practical. Using EBID material for EBSD backgrounds allows single crystal and large-grained samples to be analyzed using HR-EBSD for strain and small angle rotation measurement.
引用
收藏
页码：77 / 79
页数：3
相关论文
共 50 条
  • [1] Investigation of Pt(II) precursors for electron beam-induced deposition of Pt nanostructures
    Lu, Hang
    Spencer, Julie
    da Silva, Filipe Ferreira
    Ingolfsson, Oddur
    Fairbrother, Howard
    McElwee-Whiter, Lisa
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2018, 256
  • [2] Study of Pt(II) precursors for focused electron beam induced deposition of Pt nanostructures
    Lu, Hang
    Spencer, Julie
    Wu, Yung-Chien
    Fairbrother, Howard
    McElwee-White, Lisa
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2017, 253
  • [3] Electron-beam-induced deposition of Pt for field emitter arrays
    Morimoto, H
    Kishimoto, T
    Takai, M
    Yura, S
    Hosono, A
    Okuda, S
    Lipp, S
    Frey, L
    Ryssel, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (12B): : 6623 - 6625
  • [4] Purity and resistivity improvements for electron-beam-induced deposition of Pt
    Mulders, J. J. L.
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2014, 117 (04): : 1697 - 1704
  • [5] Purity and resistivity improvements for electron-beam-induced deposition of Pt
    J. J. L. Mulders
    Applied Physics A, 2014, 117 : 1697 - 1704
  • [6] Electron transport properties of Pt nanoarch fabricated by electron-beam-induced deposition
    Center for Quantum Science and Technology under Extreme Conditions, Osaka University, Toyonaka, Osaka 560-8531, Japan
    Jpn. J. Appl. Phys., 6 PART 2
  • [7] Electron Transport Properties of Pt Nanoarch Fabricated by Electron-Beam-Induced Deposition
    Wakaya, Fujio
    Takamoto, Kunio
    Teraoka, Tsuyoshi
    Murakami, Katsuhisa
    Abo, Satoshi
    Takai, Mikio
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (06)
  • [8] Optimization of electron beam induced deposition process for the fabrication of diode-like Pt/SiO2/W devices
    Taurino, Antonietta
    Farella, Isabella
    Cola, Adriano
    Lomascolo, Mauro
    Quaranta, Fabio
    Catalano, Massimo
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2013, 31 (04):
  • [9] Area-Selective Atomic Layer Deposition of ZnO by Area Activation Using Electron Beam-Induced Deposition
    Mameli, Alfredo
    Karasulu, Bora
    Verheijen, Marcel A.
    Barcones, Beatriz
    Macco, Bart
    Mackus, Adriaan J. M.
    Kessels, Wilhelmus M. M. Erwin
    Roozeboom, Fred
    CHEMISTRY OF MATERIALS, 2019, 31 (04) : 1250 - 1257
  • [10] Transmission-electron-microscopy observation of Pt pillar fabricated by electron-beam-induced deposition
    Center for Quantum Science and Technology under Extreme Conditions, Osaka University, Toyonaka, Osaka 560-8531, Japan
    不详
    不详
    Jpn. J. Appl. Phys., 2009, 6 PART 2 (06FF121-06FF124):
12345