Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence

被引：14

作者：

Zuppella, P. ^{[1
]}

Luciani, D. ^{[1
]}

Tucceri, P. ^{[1
]}

De Marco, P. ^{[1
]}

Gaudieri, A. ^{[1
]}

Kaiser, J. ^{[2
]}

Ottaviano, L. ^{[1
]}

Santucci, S. ^{[1
]}

Reale, A. ^{[1
]}

机构：

[1] Univ Aquila, Dipartimento Fis, Gc LNGS INFN, I-67100 Laquila, Italy

[2] Brno Univ Technol, Inst Engn Phys, Brno 61669, Czech Republic

来源：

NANOTECHNOLOGY | 2009年 / 20卷 / 11期

关键词：

INTERFEROMETRIC LITHOGRAPHY; IMPRINT;

D O I：

10.1088/0957-4484/20/11/115303

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A prototype low cost table-top Ar capillary discharge laser source (1.5 ns pulse duration, lambda = 46.9 nm) was successfully used to produce, by means of interference lithography (with a simple Lloyd mirror setup), large area (0.1 mm(2)) regular patterns from 400 nm down to 22.5 nm (half-pitch) on PMMA/Si (PMMA: polymethylmethacrylate) substrates. The experiments allowed a systematical investigation of the degree of mutual coherence of the source, giving a clear indication that the interference lithography can be pushed down to the ultimate resolution limit of lambda/4.

引用

页数：4

共 24 条

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[7] Scalable Talbot lithography with an extreme ultraviolet table top laser
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