Periodic nanostructures fabricated by Talbot extreme ultraviolet lithography

被引：1
|
作者：
Li, W. [1 ]
Patel, D. [1 ]
Menoni, C. S. [1 ]
Stein, A. [2 ]
Chao, W. [3 ]
Anderson, E. [3 ]
Marcon, M. C. [1 ]
机构：
[1] Colorado State Univ, NSF Engn Res Ctr Extreme Ultraviolet Sci & Techno, Ft Collins, CO 80523 USA
[2] Center Funct Nano Mat Brookhaven Natl Lab, Upton, NY USA
[3] Center X Ray Optic Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA
来源：
MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY XIX | 2014年 / 8973卷
关键词：
Extreme ultraviolet; laser; nanostructures; Talbot; table top; PHOTONIC CRYSTALS;
D O I：
10.1117/12.2041688
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A table top nanofabrication system which combines the classic Talbot imaging effect and a compact table top soft-x ray laser is described in this paper. Periodic nanostructures on millimeter square are fabricated using this robust, simple and defect tolerant fabrication method. Talbot lithography allows for a complete coherent extreme ultraviolet lithography process in a compact table top system. Double exposure allowed for the reduction of the feature sizes.
引用
收藏
页数：5
相关论文
共 50 条
  • [1] Extreme ultraviolet Talbot interference lithography
    Li, Wei
    Marconi, Mario C.
    OPTICS EXPRESS, 2015, 23 (20): : 25532 - 25538
  • [2] Fractional Talbot lithography with extreme ultraviolet light
    Kim, Hyun-su
    Li, Wei
    Danylyuk, Serhiy
    Brocklesby, William S.
    Marconi, Mario C.
    Juschkin, Larissa
    OPTICS LETTERS, 2014, 39 (24) : 6969 - 6972
  • [3] Defect-free fabrication of periodic structures using extreme ultraviolet Talbot lithography
    Li, W.
    Martinez-Esquiroz, V.
    Urbanski, L.
    Patel, D.
    Menoni, C. S.
    Marconi, M. C.
    Stein, A.
    2013 IEEE PHOTONICS CONFERENCE (IPC), 2013, : 635 - 636
  • [4] Scalable Talbot lithography with an extreme ultraviolet table top laser
    Urbanski, L.
    Wachulak, P.
    Isoyan, A.
    Stein, A.
    Menoni, C. S.
    Rocca, J. J.
    Marconi, M.
    2011 IEEE PHOTONICS CONFERENCE (PHO), 2011, : 839 - +
  • [5] Defect-free periodic structures using extreme ultraviolet Talbot lithography in a table-top system
    Li, Wei
    Esquiroz, Victor Martinez
    Urbanski, Lukasz
    Patel, Dinesh
    Menoni, Carmen S.
    Marconi, Mario C.
    Stein, Aaron
    Chao, Weilun
    Anderson, Erik H.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2013, 31 (06):
  • [6] Talbot interference lithography with Table-top extreme ultraviolet laser
    Li, Wei
    Kyaw, Chan
    Rockward, Willie
    Marconi, Mario
    2016 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO), 2016,
  • [7] Scalability limits of Talbot lithography with plasma-based extreme ultraviolet sources
    Danylyuk, Serhiy
    Loosen, Peter
    Bergmann, Klaus
    Kim, Hyun-su
    Juschkin, Larissa
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2013, 12 (03):
  • [8] Fabrication of trench nanostructures for extreme ultraviolet lithography masks by atomic force microscope lithography
    Kwon, Gwangmin
    Ko, Kyeongkeun
    Lee, Haiwon
    Lim, Woongsun
    Yeom, Geun Young
    Lee, Sunwoo
    Ahn, Jinho
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2011, 29 (01):
  • [9] Achromatic Talbot lithography with partially coherent extreme ultraviolet radiation: process window analysis
    Brose, Sascha
    Tempeler, Jenny
    Danylyuk, Serhiy
    Loosen, Peter
    Juschkin, Larissa
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2016, 15 (04):
  • [10] Large scale periodic magnetic nanostructures fabricated by optical interference lithography
    Carl, A
    Kirsch, S
    Wassermann, EF
    NANOPATTERNING-FROM ULTRALARGE-SCALE INTERGRATION TO BIOTECHNOLOGY, 2002, 705 : 291 - 302
12345