Small silicon-oxygen dianions in the gas phase

被引:4
|
作者
Sommerfeld, Thomas
Franzreb, Klaus
Sobers, Richard C.
Williams, Peter
机构
[1] Univ Pittsburgh, Dept Chem, Pittsburgh, PA 15260 USA
[2] Arizona State Univ, Dept Chem & Biochem, Tempe, AZ 85287 USA
基金
美国国家科学基金会;
关键词
dianions; mass spectrometry; ab initio calculations; silicon oxides;
D O I
10.1016/j.chemphys.2006.05.025
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Cs+ sputtering of a silicon target with simultaneous exposure of the Si surface to Q(2) gas has produced small silicon-oxygen dianions SinO2n+12- (2 <= n <= 8) as well as Si5O102-. These dianions were observed by mass spectrometry for ion flight times of a few 10(5-) s. The two smallest species, Si2O52- and Si3O72-, have been identified unambiguously by their isotopic abundances. Ab initio electronic structure calculations are used to study the geometrical structure of the three most abundant species Si(n)O2(n+1)(2-) (n = 3,4,5), and for all three dianions several stable isomers are found. The structural motifs of the low-energy isomers are analyzed, and include in particular structures with trivalent oxygen atoms akin to impurities in solid silicon. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:216 / 221
页数:6
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