共 9 条
- [5] Preparation of stable F-doped SiO2 thin films from Si(NCO)(4)/SiF4/02 gas mixtures using a conventional capacitively coupled RF plasma source JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (7B): : 4911 - 4916
- [6] Preparation of stable F-doped SiO2 thin films from Si(NCO)4/SiF4/O2 gas mixtures using a conventional capacitively coupled RF plasma source Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1997, 36 (7 B): : 4911 - 4916