Birefringence in fused silica and CaF2 for lithography

被引：0
|
作者：
Wang, BL [1 ]
机构：
[1] Hinds Instruments Inc, Hillsboro, OR 97124 USA
来源：
SOLID STATE TECHNOLOGY | 2000年 / 43卷 / 02期
关键词：
Aberrations - Birefringence - Calcium compounds - Excimer lasers - Fused silica - Helium neon lasers - Light polarization - Masks - Optical devices - Optical frequency conversion - Refractive index - Semiconductor device manufacture;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Studies of residual linear birefringence in fused-silica and calcium fluoride samples indicate that optical component suppliers and microlithography tool manufacturers and users need to be more aware of this property and its effect on optical lithography progresses.
引用
收藏
页码：77 / +
页数：5
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