Vapor-deposited thin films with negative real refractive index in the visible regime

被引：36
|
作者：
Jen, Yi-Jun [1 ]
Lakhtakia, Akhlesh [2 ,3 ]
Yu, Ching-Wei [1 ]
Lin, Chin-Te [1 ]
机构：
[1] Natl Taipei Univ Technol, Dept Electroopt Engn, Taipei 106, Taiwan
[2] Penn State Univ, Mat Res Inst, University Pk, PA 16802 USA
[3] Penn State Univ, Dept Engn Sci & Mech, University Pk, PA 16802 USA
来源：
OPTICS EXPRESS | 2009年 / 17卷 / 10期
关键词：
METAMATERIALS;
D O I：
10.1364/OE.17.007784
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
A thin film comprising parallel tilted nanorods was deposited by directing silver vapor obliquely towards a plane substrate. The reflection and transmission coefficients of the thin film were measured at three wavelengths in the visible regime for normal-illumination conditions, using ellipsometry and walk-off interferometry. The thin film was found to display a negative real refractive index. Since vapor deposition is a well-established industrial technique to deposit thin films, this finding is promising for large-scale production of negatively refracting metamaterials. (C) 2009 Optical Society of America
引用
收藏
页码：7784 / 7789
页数：6
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