CVD mullite coatings in high-temperature, high-pressure air-H2O

被引:52
|
作者
Haynes, JA [1 ]
Lance, MJ [1 ]
Cooley, KM [1 ]
Ferber, MK [1 ]
Lowden, RA [1 ]
Stinton, DP [1 ]
机构
[1] Oak Ridge Natl Lab, Oak Ridge, TN 37831 USA
关键词
D O I
10.1111/j.1151-2916.2000.tb01250.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Crystalline mullite was deposited by chemical vapor deposition (CVD) onto SiC/SiC composites overlaid with CVD SiC, Specimens were exposed to isothermal oxidation tests in high-pressure air + H2O at 1200 degrees C, Unprotected CVD SiC formed silica scales with a dense amorphous inner layer and a thick, porous, outer layer of cristobalite, Thin coatings (similar to 2 mu m) of dense CVD mullite effectively suppressed the rapid oxidation of CVD SiC. No microstructural evidence of mullite, volatility was observed under these temperature, pressure, and low-flow-rate conditions. Results of this preliminary study indicate that dense, crystalline, high-purity CVD mullite is stable and protective in low-velocity, high-pressure, moisture-containing environments.
引用
收藏
页码:657 / 659
页数:3
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