ALD deposited amorphous alumina coatings can slow glass alteration

被引:1
|
作者
Hiebert, Miriam E. [1 ,2 ]
Weaver, Jamie [2 ,3 ]
Lam, Thomas [2 ]
Little, Nicole [2 ]
Hyde, Ethan [2 ]
Vicenzi, Edward P. [2 ,3 ]
Phaneuf, Raymond J. [1 ]
机构
[1] Univ Maryland, Dept Mat Sci & Engn, College Pk, MD 20742 USA
[2] Smithsonian Inst, Museum Conservat Inst, 4210 Silver Hill Rd, Suitland, MD 20746 USA
[3] NIST, Mat Measurement Lab, 100 Bur Dr, Gaithersburg, MD 20899 USA
关键词
ATOMIC LAYER DEPOSITION; SURFACE; FILMS;
D O I
10.13036/17533562.63.4.07
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Atomic layer deposited (ALD) amorphous aluminium oxide and titanium oxide coatings have been investigated for use in reducing the rate of silicate glass alteration. Mass spectrometric analysis of leachate from elevated temperature aqueous immersion alteration experiments showed a marked decrease in the concentration of released Na and Si from the glass when the vitrified material was ALD coated as compared to uncoated glass. This decrease is consistent with the proposed protective effect of the ALD coating. Additionally, visual observations indicate formation of significant amounts of amorphous, secondary phase sediment for immersed, uncoated glass. This sediment was not present in the solution of the ALD coated and altered glass samples. However, the ALD coating did delaminate after protracted immersion, a likely limiting factor of the efficacy of ALD coatings. This limitation may be mitigated through a proposed refinement of the ALD coating procedure.
引用
收藏
页码:97 / 110
页数:14
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