Broadband achromatic phase retarder based on metal-multilayer dielectric grating*

被引:2
|
作者
Li, Na [1 ,2 ]
Kong, Wei-Jin [1 ,3 ]
Xia, Feng [1 ]
Yun, Mao-Jin [1 ,3 ]
机构
[1] Qingdao Univ, Coll Phys, Qingdao 266071, Peoples R China
[2] Qingdao Laoshan 2 Middle Sch, Qingdao 266071, Peoples R China
[3] Qingdao Univ, Key Lab Photon Mat & Technol Univ Shandong, Qingdao 266071, Peoples R China
基金
中国国家自然科学基金;
关键词
achromatic phase retarder; metal-multilayer dielectric grating; rigorous coupled wave analysis (RCWA); genetic algorithm (GA); COUPLED-WAVE ANALYSIS; INDUCED DAMAGE THRESHOLD; HIGH-EFFICIENCY; PULSE-COMPRESSION; 800; NM; DIFFRACTION; WAVELENGTH; DESIGN;
D O I
10.1088/1674-1056/27/5/054202
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
A new achromatic phase retarder based on a metal-multilayer dielectric grating structure is designed using the rigorous coupled wave analysis method and the genetic algorithm. The optimized phase retarder can maintain phase retardation around 90 degrees from 900 nm to 1200 nm, and the maximum deviation is less than 4.5% while the diffraction efficiencies of TE and TM waves are both higher than 95%. Numerical analysis shows the designed phase retarder has a high fabrication tolerance of groove depth, duty cycle and incident angle. This achromatic phase retarder is simple in design and stable in performance, and can be widely used in optical systems.
引用
收藏
页数:5
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