Sensitive EUV lithographic imaging self-assembled monolayer.

被引：0
|
作者：
La, YH
Chung, YJ
Kim, HJ
Maeng, S
Kang, TH
Ihm, K
Kim, KJ
Kim, B
Park, JW
机构：
[1] Pohang Univ Sci & Technol, Div Mol & Life Sci, Dept Chem, Pohang 790784, South Korea
[2] Pohang Univ Sci & Technol, Pohang Accelator Lab, Pohang, South Korea
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2002年 / 224卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
242-ORGN
引用
收藏
页码：U152 / U152
页数：1
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