Charge Trap Transistor (CTT): An Embedded Fully Logic-Compatible Multiple-Time Programmable Non-Volatile Memory Element for High-k-Metal-Gate CMOS Technologies

被引:34
|
作者
Khan, Faraz [1 ,2 ]
Cartier, Eduard [3 ]
Woo, Jason C. S. [1 ]
Iyer, Subramanian S. [1 ]
机构
[1] Univ Calif Los Angeles, Dept Elect Engn, CHIPS, Los Angeles, CA 90095 USA
[2] Global Foundries, Adv Technol Dev, Malta, NY 12020 USA
[3] IBM Res, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
关键词
High-k-metal-gate; CMOS; embedded non-volatile memory;
D O I
10.1109/LED.2016.2633490
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The availability of on-chip non-volatile memory for advanced high-k-metal-gate CMOS technology nodes has been limited due to integration and scaling challenges as well as operational voltage incompatibilities, while its need continues to grow rapidly in modern high-performance systems. By exploiting intrinsic device self-heatingenhancedcharge trapping in as fabricated highk- metal-gate logic devices, we introduce a unique multipletime programmable embedded non-volatile memory element, called the 'charge trap transistor' (CTT), for high-k-metal-gateCMOS technologies. Functionality and feasibility of using CTT memory devices have been demonstrated on 22 nm planar and 14 nm FinFET technology platforms, including fully functional product prototype memory arrays. These transistor memory devices offer high density (similar to 0.144 mu m(2)/bit for 22 nm and similar to 0.082 mu m(2)/bit for 14 nm technology), logic voltage compatible and low peak power operation (similar to 4mW), and excellent retention for a fully integrated and scalable embedded non-volatile memory without added process complexity or masks.
引用
收藏
页码:44 / 47
页数:4
相关论文
共 2 条
  • [1] 80-kb Logic Embedded High-K Charge Trap Transistor-Based Multi-Time-Programmable Memory With No Added Process Complexity
    Jayaraman, Balaji
    Leu, Derek
    Viraraghavan, Janakiraman
    Cestero, Alberto
    Yin, Ming
    Golz, John
    Tummuru, Rajesh Reddy
    Raghavan, Ramesh
    Moy, Dan
    Kempanna, Thejas
    Khan, Faraz
    Kirihata, Toshiaki
    Iyer, Subramanian S.
    IEEE JOURNAL OF SOLID-STATE CIRCUITS, 2018, 53 (03) : 949 - 960
  • [2] On-Chip Recovery Operation for Self-Aligned Nitride Logic Non-Volatile Memory Cells in High-K Metal Gate CMOS Technology
    Lin, Po-Yen
    Chiu, Yu-Lun
    Sung, Yuh-Te
    Chen, Jim
    Chang, Tzong-Sheng
    King, Ya-Chin
    Lin, Chrong Jung
    IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2015, 3 (06): : 463 - 467