Structural properties of semiconductor nanostructures from X-ray scattering

被引:0
|
作者
Stangl, J [1 ]
Schülli, T [1 ]
Hesse, A [1 ]
Holy, V [1 ]
Bauer, G [1 ]
Stoffel, M [1 ]
Schmidt, OG [1 ]
机构
[1] Johannes Kepler Univ Linz, A-4040 Linz, Austria
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中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The optical and electrical properties of self-assembled semiconductor nanostructures are strongly affected by their chemical composition and strain state. These depend sensitively on the growth conditions. X-ray diffraction techniques are used in order to investigate series of SiGe/Si(001) island samples grown by molecular beam epitaxy at various temperatures. The chemical composition distribution and the in-plane strain of uncapped islands are obtained from x-ray diffraction reciprocal space maps and from iso-strain scattering combined with anomalous scattering at the Ge K-edge. From reciprocal space maps around asymmetric Bragg reflections, also the properties of capped islands are obtained, giving insight into the structural changes during capping of SiGe islands with Si.
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页码:227 / 237
页数:11
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