Dewetting Assisted Patterning of Polystyrene by Soft Lithography to Create Nanotrenches for Nanomaterial Deposition

被引：25
|
作者：
Radha, B.
Kulkarni, G. U. [1 ]
机构：
[1] Jawaharlal Nehru Ctr Adv Sci Res, Chem & Phys Mat Unit, Bangalore 560064, Karnataka, India
来源：
ACS APPLIED MATERIALS & INTERFACES | 2009年 / 1卷 / 02期
关键词：
Polystyrene; micromolding in capillaries; soft lithography; nanotrenches; dewetting; metal nanopatterns; MICROSTRUCTURES; FABRICATION;
D O I：
10.1021/am800172f
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Micromolding in capillaries of polystyrene has been carried out using a polydimethylsiloxane stamp, derived from a compact disk (CD) as master, while heating above the glass transition temperature of polystyrene. The resulting pattern contained a replica of the parallel channels but with an important difference that trenches of width similar to 30 nm were found in between. The nanotrenches in polystyrene could be filled with metals by physical deposition and electroless plating. This method finds potential applications in nanoelectronics and nanofluidics.
引用
收藏
页码：257 / 260
页数：4
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