Anomalous Hall effect in highly Mn-Doped silicon films

被引:11
|
作者
Nikolaev, S. N. [1 ]
Aronzon, B. A. [1 ,2 ]
Ryl'kov, V. V. [1 ,2 ]
Tugushev, V. V. [1 ]
Demidov, E. S. [3 ]
Levchuk, S. A. [3 ]
Lesnikov, V. P. [3 ]
Podol'skii, V. V. [3 ]
Gareev, R. R. [4 ]
机构
[1] Kurchatov Inst, Russian Res Ctr, Moscow 123182, Russia
[2] Russian Acad Sci, Inst Theoret & Appl Electrodynam, Moscow 127412, Russia
[3] Nizhnii Novgorod State Univ, Res Physicotech Inst, Nizhnii Novgorod 603950, Russia
[4] Univ Regensburg, Inst Expt & Appl Phys, D-93040 Regensburg, Germany
基金
俄罗斯基础研究基金会;
关键词
SEMICONDUCTORS; MN4SI7;
D O I
10.1134/S0021364009120030
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The transport and magnetic properties of Mn (x) Si1 - x films with a high (x a parts per thousand 0.35) content of Mn produced by laser deposition at growth temperatures of 300-350A degrees C have been studied in a temperature range of 5-300 K in magnetic fields of up to 2.5 T. The films exhibit a hole-type metallic conductivity and a relatively weak change of magnetization in a temperature range of 50-200 K. An anomalous Hall effect with an essentially hysteretic behavior from 50 K up to a parts per thousand 230 K has been discovered. The properties of the films are explained by the two-phase model, in which ferromagnetic clusters containing interstitial Mn ions with a localized magnetic moment are embedded in the matrix of a weak band MnSi2 - x (x a parts per thousand 0.3) type ferromagnet with delocalized spin density.
引用
收藏
页码:603 / 608
页数:6
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