Full-field X-ray microscopy with crossed partial multilayer Laue lenses

被引:31
|
作者
Niese, Sven [1 ,2 ]
Krueger, Peter [1 ]
Kubec, Adam [3 ,4 ,5 ]
Braun, Stefan [5 ]
Patommel, Jens [6 ]
Schroer, Christian G. [6 ]
Leson, Andreas [5 ]
Zschech, Ehrenfried [1 ,2 ]
机构
[1] Fraunhofer IKTS Dresden, Winterbergstr 28, D-01277 Dresden, Germany
[2] Tech Univ Dresden, Dresden Ctr Nanoanal, D-01062 Dresden, Germany
[3] Tech Univ Dresden, Inst Mat Sci, D-01062 Dresden, Germany
[4] Tech Univ Dresden, Max Bergmann Ctr Biomat, D-01062 Dresden, Germany
[5] Fraunhofer IWS Dresden, D-01277 Dresden, Germany
[6] Tech Univ Dresden, Inst Strukturphys, D-01062 Dresden, Germany
来源
OPTICS EXPRESS | 2014年 / 22卷 / 17期
关键词
RESOLUTION;
D O I
10.1364/OE.22.020008
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We demonstrate full-field X-ray microscopy using crossed multilayer Laue lenses (MLL). Two partial MLLs are prepared out of a 48 m high multilayer stack consisting of 2451 alternating zones of WSi2 and Si. They are assembled perpendicularly in series to obtain two-dimensional imaging. Experiments are done in a laboratory X-ray microscope using Cu-K alpha radiation (E = 8.05 keV, focal length f = 8.0 mm). Sub-100 nm resolution is demonstrated without mixed-order imaging at an appropriate position of the image plane. Although existing deviations from design parameters still cause aberrations, MLLs are a promising approach to realize hard X-ray microscopy at high efficiencies with resolutions down to the sub-10 nm range in future. (C) 2014 Optical Society of America
引用
收藏
页码:20008 / 20013
页数:6
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