Pulsed laser deposition of nanocrystalline SiC films

Thin SiC films were grown on (1 0 0) Si substrates at temperatures from 400 to 1000 degrees C under various CH4 pressures by the pulsed laser deposition (PLD) technique using a KrF excimer laser. After deposition, films were in situ annealed at their deposition temperature under 500 mbar of CH4 for 1.0-1.5h. X-ray reflectivity investigations showed that films exhibited mass densities similar to SiC single crystal samples, while symmetrical and grazing incidence X-ray diffraction investigations found that films deposited at 800 degrees C or higher substrate temperatures were nanocrystalline. Modeling of spectroscopic ellipsometry measurements indicated that the refractive index values were similar to those reported for bulk SiC, while X-ray photoelectron spectroscopy investigations found that films contained in bulk a relatively low oxygen concentration of around 1.0 at.%. Nanoindentation results showed that the deposited SiC films were very hard, with hardness values above 40 GPa for films deposited at temperatures higher than 800 degrees C. (C) 2014 Elsevier B.V. All rights reserved.