Be/Al-based multilayer mirrors with improved reflection and spectral selectivity for solar astronomy above 17 nm wavelength

被引:46
|
作者
Chkhalo, N. I. [1 ]
Pariev, D. E. [1 ]
Polkovnikov, V. N. [1 ]
Salashchenko, N. N. [1 ]
Shaposhnikov, A. [1 ]
Stroulea, I. L. [2 ]
Svechnikov, M. V. [1 ]
Vainer, Yu. A. [1 ]
Zuev, S. Yu. [1 ]
机构
[1] Russian Acad Sci, IPM, Nizhnii Novgorod 603950, Russia
[2] JSC Kompozit, Korolev 141010, Moscow Region, Russia
基金
俄罗斯科学基金会; 俄罗斯基础研究基金会;
关键词
Multilayer mirrors; Multilayer design; X-ray mirrors; Soft X-rays; Extreme ultraviolet (EUV); Space optics; Magnetron sputtering; EXTREME-ULTRAVIOLET; FILMS; REGION;
D O I
10.1016/j.tsf.2017.04.020
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
It is shown that in the vicinity of 17 nm wavelength, Be can be used as an optically contrasting material with Al in periodic multilayer mirrors. At the same time, due to the low absorption of both Be and Al, we can expect a unique combination of reflective characteristics: record high peak reflectivity and spectral selectivity simultaneously. Although the theoretical reflectivity of a Be/Al multilayer is 78% at normal incidence and at the 17.14 nm wavelength, we recorded only 46% for a pure Be/Al structure. The introduction of 1 nm Si on top of the Be layers in each period increases the reflection up to 61% at normal incidence. The increase of the reflection coefficient of Be/Si/Al multilayer mirrors is conditioned by smoothing the interfaces from root-mean-square value of 1.3nm in pure Be/Al structures to 0.6nm in Si-containing samples. We suppose that the smoothing effect is connected with the amorphization of Al films in the presence of Si. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:106 / 111
页数:6
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