Comparison of collision treatment methods in PIC-MC plasma simulation

被引:4
|
作者
Simek, J. [1 ]
Hrach, R. [1 ]
机构
[1] Charles Univ, Fac Math & Phys, Dept Elect & Vacuum Phys, CR-18000 Prague, Czech Republic
关键词
plasma discharge; PIC simulations; scattering events;
D O I
10.1007/s10582-006-0331-z
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
There exists a demand of using plasma systems at higher pressures. Unfortunately, till now there does not exist a complete theory of plasma-solid interaction for such conditions. The problem is in the effect of collisions among plasma particles. Therefore the correct treatment of collisions in computer simulations is very important. Commonly used PIC-MC technique usually uses collision treatment method based on random free path. In this contribution it is shown how this method can affect the velocity distributions of particles and in this way the whole studied system. Then another approach is suggested. Differences of results for these two methods are discussed for the case of study of sheath formation.
引用
收藏
页码:B1086 / B1090
页数:5
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