Modification of poly(methyl methacrylate) by keV Ar deposition

被引:8
|
作者
Su, Ya-Ting [1 ,2 ]
Shan, Tzu-Ray [1 ]
Sinnott, Susan B. [1 ]
机构
[1] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[2] Natl Tsing Hua Univ, Dept Chem Engn, Hsinchu, Taiwan
基金
美国国家科学基金会;
关键词
PMMA; Deposition; Surface modification; Argon bombardment; Molecular dynamics simulation; AIREBO potential; MOLECULAR-DYNAMICS SIMULATIONS; ION MASS-SPECTROMETRY; POLYMETHYL METHACRYLATE; CARBON NANOTUBES; BEAM DEPOSITION; ABLATION; POLYSTYRENE; SURFACE; TEMPERATURE; HYDROCARBONS;
D O I
10.1016/j.nimb.2009.06.008
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Classical molecular dynamics simulations are used to examine 1 keV Ar atom bombardment on the surface of poly(methyl methacrylate) (PMMA), which induces sputtering and chemical modifications to the surface. The simulations are carried out at various surface temperatures that range from 200 to 600 K. The results indicate that different fragments of PMMA, as characterized by their mass, are preferentially sputtered from the surface at the various temperatures considered. In addition, the simulations predict that small fragments are produced by the high energy deposition process. However, larger sized fragments are generated when the surface temperature is close to the glass transition temperature of PMMA. The atomic-scale processes by which these occur are elucidated by the simulations. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:2525 / 2531
页数:7
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