共 50 条
- [1] Advancements in organic anti-reflective coatings for Dual Damascene processes METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIV, 2000, 3998 : 797 - 805
- [3] Planarization approaches to via-first dual-damascene processing CHALLENGES IN PROCESS INTEGRATION AND DEVICE TECHNOLOGY, 2000, 4181 : 140 - 151
- [5] Void elimination research in bottom anti-reflective coatings for dual damascene photolithography ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XX, PTS 1 AND 2, 2003, 5039 : 891 - 901
- [6] Optimization of the planarizing performance of a DUV organic Bottom Anti-Reflective Coating for via first Dual Damascene process:: Cooperation to achieve material and process characterization. MICROLITHOGRAPHIC TECHNIQUES IN INTEGRATED CIRCUIT FABRICATION II, 2000, 4226 : 160 - 168
- [7] Development of full-fill bottom anti-reflective coatings for dual damascene process ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVIII, PTS 1 AND 2, 2001, 4345 : 838 - 845
- [8] Importance of resist transparency and development rate control in via-first dual damascene processes ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIX, PTS 1 AND 2, 2002, 4690 : 586 - 597
- [9] BARC (Bottom anti-reflective coating) for immersion process ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIV, 2007, 6519
- [10] Using molecular modeling to understand cleaner efficiency for BARC ("bottom anti-reflective coating") after plasma etch in dual damascene structures EUROSIME 2007: THERMAL, MECHANICAL AND MULTI-PHYSICS SIMULATION AND EXPERIMENTS IN MICRO-ELECTRONICS AND MICRO-SYSTEMS, PROCEEDINGS, 2007, : 29 - +