STRUCTURE AND OPTICAL PROPERTIES OF HIGH-RATE LOW-TEMPERATURE GROWN TiO2 THIN FILMS BY REACTIVE MAGNETRON SPUTTERING

被引：3
|
作者：
Li Zhuguo [1 ]
Miyake Shoji [2 ]
机构：
[1] Shanghai Jiao Tong Univ, Sch Mat Sci & Engn, Shanghai Key Lab Mat Laser Proc & Modificat, Shanghai 200240, Peoples R China
[2] Kinki Univ, Osaka 5778502, Japan
来源：
ACTA METALLURGICA SINICA | 2010年 / 46卷 / 01期
基金：
中国国家自然科学基金;
关键词：
TiO2 thin film; magnetron sputtering; metallic sputtering mode; low-temperature deposition; refractive index; DEPOSITION; PLASMA;
D O I：
10.3724/SP.J.1037.2009.00480
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
TiO2 thin films have been deposited on unheated glass substrates by all inductively coupled plasma (ICP) assisted direct current (dc) reactive magnetron sputtering. XRD, TEM and UV-Vis spectrophotometer have been used to characterize the films. It is shown that the addition of an ICP and the change of gas input strongly affect film growth and structure. High quality anatase phase TiO2 film has been prepared at the metallic mode of sputtering and at low deposition temperature by using the ICP assisted dc reactive magnetron sputtering and creating a gradient of oxygen favoring the oxidation of the growing film. This film is quite transparent in the visible region, and its refractive index n and the extinction coefficient K at 550 ran are 2.51 and 7.8 x 10(-4), respectively.
引用
收藏
页码：13 / 18
页数：6
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