Two different lasers integrated in a monochip by one-step epitaxy

被引:1
|
作者
Guo, WL [1 ]
Shen, GD
Li, JJ
Ding, Y
Liu, Y
Gao, G
Zou, DS
机构
[1] Beijing Polytech Univ, Dept Elect Engn, Beijing 100022, Peoples R China
[2] Beijing Polytech Univ, Beijing Optoelect Technol Lab, Beijing 100022, Peoples R China
基金
中国国家自然科学基金;
关键词
semiconductor lasers; integration; monochip; tunnel junction; dual-wavelength;
D O I
10.1117/1.1506372
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A new way to integrate two different lasers (LD1: 950 nm and LD2: 990 nm) in a monochip by one-step epitaxial growth is presented. These two lasers are cascaded by a high-doping tunnel junction that separates the two active regions so that a four-terminal device can be implemented, which permits the operation of the lasers electrically independent as LD1, LD2, and LD1+LD2 after fabrication process. High power dual-wavelength operation laser diodes are fabricated, output power as high as 3.1 W at 3 A and 2.4 W at 2 A is obtained, and the slope efficiency can reach 1.38 W/A. As for four-terminal integrated laser diodes, the threshold current is 54, 58, and 65 mA, and the slope efficiency is 0.73, 0.48, and 0.37 for the LD1+LD2, LD1, and LD2, respectively. (C) 2002 Society of Photo-Optical Instrumentation Engineers.
引用
收藏
页码:2391 / 2392
页数:2
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