Nonvolatile MoS2 field effect transistors directly gated by single crystalline epitaxial ferroelectric

被引:24
|
作者
Lu, Zhongyuan [1 ]
Serrao, Claudy [1 ]
Khan, Asif Islam [1 ]
You, Long [1 ]
Wong, Justin C. [1 ]
Ye, Yu [2 ]
Zhu, Hanyu [2 ]
Zhang, Xiang [2 ]
Salahuddinl, Sayeef [1 ]
机构
[1] Univ Calif Berkeley, Elect Engn & Comp Sci, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Mech Engn, Berkeley, CA 94720 USA
关键词
METAL-INSULATOR-TRANSITION; MONOLAYER; MOBILITY;
D O I
10.1063/1.4992113
中图分类号
O59 [应用物理学];
学科分类号
摘要
We demonstrate non-volatile, n-type, back-gated, MoS2 transistors, placed directly on an epitaxial grown, single crystalline, PbZr0.2Ti0.8O3 (PZT) ferroelectric. The transistors show decent ON current (19 mu A/mu m), high on-off ratio (10(7)), and a subthreshold swing of (SS similar to 92 mV/dec) with a 100 nm thick PZT layer as the back gate oxide. Importantly, the ferroelectric polarization can directly control the channel charge, showing a clear anti-clockwise hysteresis. We have self-consistently confirmed the switching of the ferroelectric and corresponding change in channel current from a direct time-dependent measurement. Our results demonstrate that it is possible to obtain transistor operation directly on polar surfaces, and therefore, it should be possible to integrate 2D electronics with single crystalline functional oxides. Published by AIP Publishing.
引用
收藏
页数:4
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