Quasi-static capacitance of a weakly compensated semiconductor with hopping conduction (on the example of p-Si:B)

被引:2
|
作者
Poklonski, N. A. [1 ]
Vyrko, S. A.
Zabrodskii, A. G.
机构
[1] Belarusian State Univ, Minsk 220030, BELARUS
[2] Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 194021, Russia
基金
俄罗斯基础研究基金会;
关键词
D O I
10.1134/S1063782607010083
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
A moderately doped semiconductor is considered on the insulator side of the insulator-metal phase transition, where the acceptors in (-1), (0), and (+1) charge states form A(O) and A(+) bands. The expressions are derived for the Debye-Huckel and Schottky-Mott screening lengths of an external electrostatic field for the case of hopping transport of holes via acceptors. The quasistatic capacitance of a semiconductor is calculated in the temperature region where hopping hole conductances in the A(O) and A(+) bands are approximately equal. It is shown that the Debye-Huckel screening length can be determined using the measurements of quasistatic capacitance even in the high-field regime, i.e., in the Schottky-Mott approximation. The frequency of an electric signal in the measurements of quasistatic semiconductor capacitance in a metal-insulator-semiconductor structure must be much lower than the average frequency of hole hopping via acceptors (boron atoms in silicon).
引用
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页码:30 / 36
页数:7
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