Growth characteristics and texture of cubic boron nitride films produced by CVD

被引：0
|
作者：
Jiang, X
Helming, K
Zhang, WJ
Matsumoto, S
机构：
[1] Fraunhofer Inst Schicht & Oberflachentechn, D-38108 Braunschweig, Germany
[2] Tech Univ Clausthal, Inst Phys & Phys Technol, D-38678 Clausthal Zellerfeld, Germany
[3] Natl Inst Mat Sci, Adv Mat Lab, Tsukuba, Ibaraki 3050044, Japan
来源：
CHEMICAL VAPOR DEPOSITION | 2002年 / 8卷 / 06期
关键词：
D O I：
10.1002/1521-3862(20021203)8:6<262::AID-CVDE262>3.0.CO;2-W
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Communication: Thick cubic BN films have been grown by bias-assisted DC jet plasma CVD (see Figure). The composition, morphology, and structure of the deposited films are studied. The growth is shown to undergo a Van der Drift grain-evolution competition, forming a preferential alignment of <001> grain axes approximately perpendicular to the film surface.
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页码：262 / +
页数：5
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