F2-lasers:: High-resolution optical processing system for shaping photonic components

A high-resolution 157-nm optical system has been developed for the first time to microprocess optical materials with record short-wavelength F-2-laser radiation. The F-2-laser photons drive strong material interactions in silica glasses for microsculpting surfaces and for imprinting internal refractive index structures. The high-resolution optics delivers a homogenized beam of high on-target fluence (similar to2.5 J/cm(2)) for ablation of fused silica and other wide bandgap optical materials. The system resolution is approaching 1-micron lateral and < 100-nm depth - sub-wavelength features appropriate for defining optical communication components at 1.55-mum wavelength. This paper describes this novel processing system and offers prospects for F-2-laser microfabrication and trimming of photonic components in the telecommunication and general optics manufacturing fields.