Anti-reflective coating by 3D PDMS stamping using two-photon lithography master

被引：3
|
作者：
Schnee, Vincent P. [1 ]
Henry, Nathan [1 ]
Huynh, Quyen [1 ]
机构：
[1] US Army AFC Combat Capabil Dev Command C5ISR Ctr, Aberdeen Proving Ground, MD USA
来源：
OPTICAL MATERIALS | 2021年 / 111卷
关键词：
PDMS; Nanoscribe; Anti-reflective coating; NANOFABRICATION; SURFACES;
D O I：
10.1016/j.optmat.2020.110715
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A method for the repeated manufacture of nanoscale optical features is presented. The method utilizes nanoscale 3D printing technology to create master structures that can be rapidly duplicated using a soft lithography method. Stamps are made of polydimethylsiloxane (PDMS) from the master structure and then inked with a mixture of nanoparticles and epoxy to create a 3D negative of the master structure. To demonstrate this method, an array of pyramids comprised of germanium (Ge) nanoparticles and epoxy were produced to function as an antireflective coating in the short wave infrared (SWIR). The antireflective array was tested and compared to 5 commercial low reflective coatings.
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页数：5
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