Study on Resistance Switching Properties of Na0.5Bi0.5TiO3 Thin Films Using Impedance Spectroscopy

被引:30
|
作者
Zhang, Ting [1 ]
Zhang, Xinan [1 ]
Ding, Linghong [1 ]
Zhang, Weifeng [1 ]
机构
[1] Henan Univ, Sch Phys & Elect, Key Lab Photovolta Mat Henan Prov, Kaifeng 475004, Peoples R China
来源
NANOSCALE RESEARCH LETTERS | 2009年 / 4卷 / 11期
关键词
Na0.5Bi0.5TiO3 (NBT) thin films; Resistance switching; Impedance spectroscopy; Interfacial characteristics; Oxygen vacancies; DIELECTRIC-RELAXATION; SRTIO3;
D O I
10.1007/s11671-009-9397-4
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The Na0.5Bi0.5TiO3 (NBT) thin films sandwiched between Au electrodes and fluorine-doped tin oxide (FTO) conducting glass were deposited using a sol-gel method. Based on electrochemical workstation measurements, reproducible resistance switching characteristics and negative differential resistances were obtained at room temperature. A local impedance spectroscopy measurement of Au/NBT was performed to reveal the interface-related electrical characteristics. The DC-bias-dependent impedance spectra suggested the occurrence of charge and mass transfer at the interface of the Au/NBT/FTO device. It was proposed that the first and the second ionization of oxygen vacancies are responsible for the conduction in the low-and high-resistance states, respectively. The experimental results showed high potential for nonvolatile memory applications in NBT thin films.
引用
收藏
页码:1309 / 1314
页数:6
相关论文
共 50 条
  • [1] Study on Resistance Switching Properties of Na0.5Bi0.5TiO3Thin Films Using Impedance Spectroscopy
    Ting Zhang
    Xinan Zhang
    Linghong Ding
    Weifeng Zhang
    Nanoscale Research Letters, 4
  • [2] Good energy storage properties of Na0.5Bi0.5TiO3 thin films
    Wang, Fang
    Zhu, Cong
    Zhao, Shifeng
    JOURNAL OF ALLOYS AND COMPOUNDS, 2021, 869
  • [3] Good energy storage properties of Na0.5Bi0.5TiO3 thin films
    Wang, Fang
    Zhu, Cong
    Zhao, Shifeng
    Journal of Alloys and Compounds, 2021, 869
  • [4] Electrical properties of Na0.5Bi0.5TiO3 thin films deposited on sitall substrates
    Kruzina, T. V.
    Popov, S. A.
    Potapovich, Yu. N.
    Ryabtsev, S. I.
    Rutskiy, A. S.
    Suchanicz, J.
    APPLIED NANOSCIENCE, 2022, 12 (04) : 957 - 963
  • [5] Electrical properties of Na0.5Bi0.5TiO3 thin films deposited on sitall substrates
    T. V. Kruzina
    S. A. Popov
    Yu. N. Potapovich
    S. I. Ryabtsev
    A. S. Rutskiy
    J. Suchanicz
    Applied Nanoscience, 2022, 12 : 957 - 963
  • [6] Some properties of Na0.5Bi0.5TiO3
    Suchanicz, J
    Poprawski, R
    Matyjasik, S
    FERROELECTRICS, 1997, 192 (1-4) : 329 - 333
  • [7] Some properties of Na0.5Bi0.5TiO3
    Pedagogical Univ, Krakow, Poland
    Ferroelectrics, 1-4 (329-333):
  • [8] RAMAN-SPECTROSCOPY OF NA0.5BI0.5TIO3
    ZHANG, MS
    SCOTT, JF
    ZVIRGZDS, JA
    FERROELECTRICS LETTERS SECTION, 1986, 6 (05) : 147 - 152
  • [9] Thin films of Na0.5Bi0.5TiO3 deposited by spin-coating
    Mercurio, JP
    Marchet, P
    INTEGRATED FERROELECTRICS, 2004, 61 : 163 - 165
  • [10] Growth and Characterization of Na0.5Bi0.5TiO3 Thin Films with BaTiO3 Buffer Layer (Study of Au/Na0.5Bi0.5TiO3/BaTiO3/Pt Capacitor)
    Daryapurkar, A. S.
    Kolte, J. T.
    Gopalan, P.
    FERROELECTRICS, 2013, 447 (01) : 46 - 55