Electro-mechanical properties and oxidation behaviour of TiAlNxOy thin films at high temperatures

被引:9
|
作者
Zarfl, C. [1 ]
Schmid, P. [1 ]
Balogh, G. [1 ]
Schmid, U. [1 ]
机构
[1] Vienna Univ Technol, Inst Sensor & Actuator Syst, A-1040 Vienna, Austria
关键词
TiAlN; TiAlON; Strain gauge; High temperature; Gauge factor; TCR; Oxidation; STRAIN; PRESSURE; SENSITIVITY; DEPOSITION; MORPHOLOGY; COATINGS;
D O I
10.1016/j.sna.2015.02.026
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
TiAlNxOy thin films are investigated as possible candidates for high temperature stable strain gauge applications. The thin films are deposited by reactive magnetron sputtering on sapphire and silicon substrates with a thickness of 500 nm and 200 nm, respectively. The gauge factor is measured with a custom built setup up to 500 degrees C. At 100 degrees C this electro-mechanical parameter is about 2.5 and the mean value decreases by about 10% when exposed to the maximum temperature level applied in this study. The temperature coefficient of the electrical resistance (TCR) is measured under vacuum conditions. The TCR is negative and with a value of -5.13 x 10(-4) K-1 very low compared to +3 x 10(-3) K-1 determined at sputter-deposited platinum films. Furthermore, the influence of oxidation effects on the electro-mechanical film properties is investigated. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:143 / 148
页数:6
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