Low-temperature formation of nanocrystalline β-SiC with high surface area and mesoporosity via reaction of mesoporous carbon and silicon powder

被引:77
|
作者
Liu, ZC [1 ]
Shen, WH [1 ]
Bu, WB [1 ]
Chen, HR [1 ]
Hua, ZL [1 ]
Zhang, LX [1 ]
Li, L [1 ]
Shi, JL [1 ]
Tan, SH [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China
基金
中国博士后科学基金;
关键词
nanocrystalline; beta-SiC; mesoporosity; low-temperature formation; mesoporous carbon; Si powder;
D O I
10.1016/j.micromeso.2005.02.022
中图分类号
O69 [应用化学];
学科分类号
081704 ;
摘要
We report here a new route to prepare nanocrystalline beta-silicon carbide with high specific surface areas and mesoporosity. The preparation method was via the reaction of ordered mesoporous carbons (OMCs, carbon replicas of MCM-48, SBA-15 and KIT-6) with silicon powder at the temperature of 1200-1300 degrees C, which is below the melting point of silicon, 1420 degrees C. The SiC samples were characterized by XRD, SEM, TEM, N-2 adsorption and other techniques, which showed that the SiC samples were nanocrystalline and had a high surface area of up to 147 m(2) g(-1) and a mesoporosity in the range of 5-40 nm. In addition, the silicon vapor infiltration method at a temperature beyond 1420 degrees C was also brought into comparison. (c) 2005 Elsevier Inc. All rights reserved.
引用
收藏
页码:137 / 145
页数:9
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