Surface reaction of C60 with atomic hydrogen:: Formation of a protecting hydrocarbon layer

被引：5
|
作者：
Eremtchenko, M
Öttking, R
Krischok, S
Döring, S
Temirov, R
Schaefer, JA
机构：
[1] Tech Univ Ilmenau, Inst Phys, D-98684 Ilmenau, Germany
[2] Tech Univ Ilmenau, Zentrum Mikro & Nanotechnol, D-98684 Ilmenau, Germany
来源：
FULLERENES NANOTUBES AND CARBON NANOSTRUCTURES | 2005年 / 13卷
关键词：
fullerenes; nucleation; molecular films; scanning tunneling microscopy; adsorbate vibrations;
D O I：
10.1081/FST-200039235
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The interaction of a single domain C-60/InP(001)-(2 x 4) film during exposure to atomic hydrogen was investigated. At low hydrogen dosing, a high reactivity of the C-60 molecules was detected. Presumably, the cracking of fullerene cages follows from a fast destruction of the molecular order. High dosing leads, by chemical modification, to the formation of a stable coverage of hydrocarbons, which is promising for future technological applications.
引用
收藏
页码：131 / 138
页数：8
相关论文
共 50 条
  • [1] Effect of Catalysts on the Reaction of C60 with Hydrogen
    Luzan, S. M.
    Talyzin, A. V.
    FULLERENES NANOTUBES AND CARBON NANOSTRUCTURES, 2012, 20 (4-7) : 319 - 323
  • [2] C60 adsorption onto the one-atomic-layer In films on Si(111) surface
    Gruznev, D. V.
    Matetskiy, A. V.
    Gvozd, I. V.
    Zotov, A. V.
    Saranin, A. A.
    SURFACE SCIENCE, 2011, 605 (23-24) : 1951 - 1955
  • [3] Reaction of C60 with Hydrogen Gas: In Situ Monitoring and Pathways
    Luzan, Serhiy M.
    Tsybin, Yury O.
    Talyzin, Alexandr V.
    JOURNAL OF PHYSICAL CHEMISTRY C, 2011, 115 (23): : 11484 - 11492
  • [4] Breathing-trap mechanism for encapsulation of atomic hydrogen in C60
    Long, Zhongqu
    Zhou, Xiang
    Cai, Hao
    Chen, Chi
    Miao, Ling
    Allen, Roland E.
    CHEMICAL PHYSICS LETTERS, 2013, 583 : 114 - 118
  • [5] EPR study of the reaction of C60 with chlorine dioxide:: experimental evidence for the formation of the C60 radical cation
    Sokolov, VI
    Bashilov, VV
    Timerghazin, QK
    Avzyanova, EV
    Khalizov, AF
    Shishlov, NM
    Shereshovets, VV
    MENDELEEV COMMUNICATIONS, 1999, (02) : 54 - 55
  • [6] Influence of the Formation Parameters of Phthalociane:Fullerene Nanocomposite Layer on the Photoelectric Characteristics of ZnPc:C60/C60 Structures
    M. D. Pavlova
    A. E. Degterev
    I. A. Lamkin
    S. A. Tarasov
    Semiconductors, 2020, 54 : 1800 - 1804
  • [7] Influence of the Formation Parameters of Phthalociane:Fullerene Nanocomposite Layer on the Photoelectric Characteristics of ZnPc:C60/C60 Structures
    Pavlova, M. D.
    Degterev, A. E.
    Lamkin, I. A.
    Tarasov, S. A.
    SEMICONDUCTORS, 2020, 54 (13) : 1800 - 1804
  • [8] Atomic nitrogen in C60:N@C60
    A. Weidinger
    M. Waiblinger
    B. Pietzak
    T. Almeida Murphy
    Applied Physics A, 1998, 66 : 287 - 292
  • [9] Atomic nitrogen in C60:N@C60
    Weidinger, A
    Waiblinger, M
    Pietzak, B
    Murphy, TA
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1998, 66 (03): : 287 - 292
  • [10] Dimerization reaction of C60
    SUN Dayong
    ChineseScienceBulletin, 1997, (07) : 615 - 616
12345