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A route to single-crystalline ZnO films with low residual electron concentration
被引:11
|作者:
Liu, J. S.
[1
,2
]
Shan, C. X.
[1
]
Wang, S. P.
[1
,2
]
Sun, F.
[1
,2
]
Yao, B.
[1
]
Shen, D. Z.
[1
]
机构:
[1] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R China
[2] Chinese Acad Sci, Grad Sch, Beijing 100049, Peoples R China
关键词:
X-ray diffraction;
Molecular beam epitaxy;
Zinc compounds;
Semiconducting II-VI materials;
EMISSION;
DEFECTS;
EPITAXY;
GROWTH;
GAN;
D O I:
10.1016/j.jcrysgro.2010.07.006
中图分类号:
O7 [晶体学];
学科分类号:
0702 ;
070205 ;
0703 ;
080501 ;
摘要:
Single-crystalline ZnO films have been grown on a-plane sapphire in plasma assisted molecular beam epitaxy by introducing a high-temperature ZnO buffer layer. The residual electron concentration of the films can be lowered to 1.5 x 10(16) cm(-3), comparable with the best value ever reported for ZnO films grown on a rare and costly substrate of ScAlMgO4. A 3 x 3 reconstruction has been observed on the films grown in this route, which reveals that the films have very smooth surface. X-ray phi-scan spectrum of the films shows six peaks with 60 intervals, and two-dimensional X-ray diffraction datum indicates the single-crystalline nature of the films. Low temperature photoluminescence spectrum of the films shows a dominant free exciton emission and five phonon replicas, confirming the high quality of the films. (C) 2010 Elsevier B.V. All rights reserved.
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页码:2861 / 2864
页数:4
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