Automatic mask adaptation of CMOS-compatible micromachined devices using their finite element model

This paper reports on an extension of a FEM-to-layout converter which gives the designer of microsystems the opportunity to adapt existing microsystems on the structural level towards personal requirements. This tool enables the designer to change the properties of such microsystems on the level of a finite element model. After the accomplishment of the changes, the corresponding masks of these devices are adapted automatically on the layout level, so that it is not necessary for the designer to have knowledge of the specific layers which are necessary to fabricate these devices and, therefore, have to be adapted.