Interferometric measurements of electric field-induced displacements in piezoelectric thin films

被引:358
|
作者
Kholkin, AL
Wutchrich, C
Taylor, DV
Setter, N
机构
[1] Laboratoire de Céramique, Ecl. Polytech. Federale de Lausanne
来源
REVIEW OF SCIENTIFIC INSTRUMENTS | 1996年 / 67卷 / 05期
关键词
D O I
10.1063/1.1147000
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Interferometric measurements of electric field-induced displacements in piezoelectric thin films using single-beam and double-beam optical detection schemes are reported. It is shown that vibrational response measured with a single-beam interferometer includes a large contribution of the bending motion of substrate. Therefore, it is difficult to apply single-beam technique for piezoelectric measurements in thin films. To suppress the bending effect a high-resolution double-beam interferometer is proposed. The sensitivity of the interferometer is significantly improved in comparison with previously reported system. The interferometer is shown to resolve small displacements without using a lock-in technique. An example of the interferometric capabilities is demonstrated with experimental results on electric field, frequency, and time dependences of piezoelectric response for quartz and Pb(Zr,Ti)O-3 thin film. (C) 1996 American Institute of Physics.
引用
收藏
页码:1935 / 1941
页数:7
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