4Pi spectral self-interference microscopy

被引:5
|
作者
Davis, Brynmor J. [1 ]
Dogan, Mehmet [2 ]
Goldberg, Bennett B. [2 ,3 ,4 ]
Karl, William C. [3 ,4 ]
Unlue, M. Selim [3 ,4 ]
Swan, Anna K. [3 ]
机构
[1] Univ Illinois, Beckman Inst Adv Sci & Technol, Urbana, IL 61801 USA
[2] Boston Univ, Dept Phys, Boston, MA 02215 USA
[3] Boston Univ, Dept Elect & Comp Engn, Boston, MA 02215 USA
[4] Boston Univ, Dept Biomed Engn, Boston, MA 02215 USA
关键词
D O I
10.1364/JOSAA.24.003762
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Spectral self-interference microscopy (SSM) relies on the balanced collection of light traveling two different paths from the sample to the detector, one direct and the other indirect from a reflecting substrate. The resulting spectral interference effects allow nanometer-scale axial localization of isolated emitters. To produce spectral fringes the difference between the two optical paths must be significant. Consequently, to ensure that both contributions are in focus, a low-numerical-aperture objective lens must be used, giving poor lateral resolution. Here this limitation is overcome using a 4Pi apparatus to produce the requisite two paths to the detector. The resulting instrument generalizes both SSM and 4Pi microscopy and allows a quantification of SSM resolution (rather than localization precision). Specifically, SSM is shown to be subject to the same resolution constraints as 4Pi microscopy. (D 2007 Optical Society of America.
引用
收藏
页码:3762 / 3771
页数:10
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