Effect of InP passivation on carrier recombination in InxGa1-xAs/GaAs surface quantum wells

被引:1
|
作者
Lipsanen, H [1 ]
Sopanen, M [1 ]
Ahopelto, J [1 ]
Sandmann, J [1 ]
Feldmann, J [1 ]
机构
[1] Helsinki Univ Technol, Optoelect Lab, FIN-02150 Espoo, Finland
关键词
D O I
10.1109/ICIPRM.1998.712601
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Carrier recombination in surface and near-surface InxGa1-xAs/GaAs quantum wells was studied using time-resolved and cw photoluminescence spectroscopy. Surface passivation by an ultrathin layer (I ML) of InP was found to yield dramatically enhanced luminescence intensity. A blue shift due to the vacuum barrier on the surface was measured to be as high as 70 meV for a passivated 3 nm thick In0.25Ga0.75As/GaAs surface QW. The carrier recombination dynamics was studied for 7 nm thick In0.10Ga0.90As/GaAs surface and near-surface QWs. A carrier lifetime of 40 ps was obtained for an unpassivated near-surface QW whereas lifetimes of 300 ps and 245 ps were measured for passivated near-surface and surface QWs, respectively. The results indicate that the passivation reduces the surface recombination remarkably.
引用
收藏
页码:549 / 551
页数:3
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