Fabrication of Nd:YVO4 thin film waveguide grown on Si/SiO2 by pulsed laser deposition

被引：0
|
作者：
Li, Hongxia [1 ]
Song, Renguo [1 ]
Wu, Xin [2 ]
Wang, Jiyang [3 ]
机构：
[1] Zhejiang Univ Technol, MOE Key Lab Mech Mfg & Automat, Hangzhou 310014, Zhejiang, Peoples R China
[2] Hangzhou Dianzi Univ, Sch Mech Engn, Hangzhou 310018, Peoples R China
[3] Shandong Univ, State Key Lab Crystal Growth, Jinan 250100, Peoples R China
来源：
SURFACE ENGINEERING (ICSE 2007) | 2008年 / 373-374卷
关键词：
thin films; laser deposition; atomic force microscopy; X-ray diffraction;
D O I：
10.4028/www.scientific.net/KEM.373-374.142
中图分类号：
TH [机械、仪表工业];
学科分类号：
0802 ;
摘要：
High quality Nd:YVO4 thin films were fabricated successfully by using a pulsed laser deposition technique. The properties of the samples were characterized by using X-ray diffraction, atomic force microscopy, and prism-coupling measurements. According to above discussion, we concluded the optimal preparation conditions for Nd:YVO4 films prepared on Si/SiO2 substrates.
引用
收藏
页码：142 / +
页数：2
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