Formation and characterization of crystalline iron oxide films on self-assembled organic monolayers and their in situ patterning

被引:10
|
作者
Shin, H
Jeon, JU
Pak, YE
Im, H
Kim, ES
机构
[1] Samsung Adv Inst Technol, Nano Syst Lab, Suwon 440600, South Korea
[2] CRI, Suwon 440600, South Korea
[3] Samsung Adv Inst Technol, MEMS Lab, Suwon, South Korea
[4] Yonsei Univ, Dept Ceram Engn, Seoul, South Korea
[5] Kyonggi Univ, Dept Mat Engn, Suwon, South Korea
关键词
D O I
10.1557/JMR.2001.0081
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Crystalline and pore-free films of alpha -Fe2O3 were prepared on hydrophilic self-assembled organic monolayers (DTT-SAMs) at 80 degreesC, Subsequently, Fe3O4 and gamma -Fe2O3 films were synthesized via post annealing of as-deposited alpha -Fe2O3. In situ patterning of crystalline iron oxide thin layers was achieved via microcontact printing (mu CP) and selective deposition. mu CP was used to pattern two different surface moieties of self-assembled organic monolayers (SAMs) on Au-Cr-Si substrates. An elastomeric stamp was used to transfer either hexadecanethiol (HDT) SAMs, which are to sustain deposition of iron oxide precipitates, or hydrophilic SAMs [e.g., dithiothreitol (DTT)]. Selective deposition was realized through precipitation of iron oxide phases. Iron oxide films were deposited onto hydrophilic SAMs, but not onto HDT surfaces. Line (width of <1 <mu>m) patterns in crystalline alpha -Fe2O3 thin films were obtained.
引用
收藏
页码:564 / 569
页数:6
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