Ferroelectric emission studies for electron emission lithography applications

被引：0
|
作者：
Yoo, IK [1 ]
Ryu, SO [1 ]
Suchicital, C [1 ]
Lee, JK [1 ]
Kim, BM [1 ]
Chung, JW [1 ]
机构：
[1] Samsung Adv Inst Technol, Suwon 440600, Kyongki, South Korea
来源：
PROCEEDINGS OF THE 2001 12TH IEEE INTERNATIONAL SYMPOSIUM ON APPLICATIONS OF FERROELECTRICS, VOLS I AND II | 2001年
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Ferroelectric switching emission, dielectric switching emission, and pyroelectric emission were studied by patterning images on electron resist for electron emission lithography applications. It was observed that the pyroelectric emission is most acceptable for a high throughput 1:1 electron projection lithography application. A 1:1 electron projection lithography was demonstrated by patterning images with line widths of 30 mum by utilizing pyroelectric emission. A degradation of the pyroelectric emission property of the material was observed during repeated heating cycles below the phase transition temperature of the ferroelectric material. Annealing excursions above the phase transition temperature prevented the degradation of the pyroelectric emitter.
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页码：215 / 218
页数：4
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