Low-Rate Sputter-Deposited Fe3Si Thin Films on Si Substrates: Structural and Ferromagnetic Properties

被引：0
|
作者：
Liew, S. L. [1 ]
Seng, D. H. L. [1 ]
Tan, H. R. [1 ]
Chi, D. Z. [1 ]
机构：
[1] ASTAR, Inst Mat Res & Engn, Singapore 117602, Singapore
来源：
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | 2011年 / 11卷 / 03期
关键词：
Structural; Ferromagnetic; Fe3Si; MAGNETIC-PROPERTIES; EPITAXIAL-GROWTH; ALLOYS;
D O I：
10.1166/jnn.2011.2710
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Fe3Si thin films were sputter-deposited on Si(001) substrates. Structural investigations show that Fe3Si was deposited poly-crystalline with a Si-containing layer at the Fe3Si/Si interface. The formation of the layer was attributed to the influence of low deposition rates used in this study on the grain nucleation in Fe3Si. This layer helps to stabilize the ferromagnetic properties of the subsequent annealed films at 350 degrees C with 5 Oe obtained for coercive field H-c, similar to 920 emu/cm(3) for saturation magnetization M-s and similar to 0.9M(s) for remnant magnetization M-r.
引用
收藏
页码：2687 / 2690
页数：4
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