Experimental Study of Thermal Contact Resistance between AlN and Kovar Alloy by Laser Flash Method

被引：0
|
作者：
Lin, Zhang [1 ]
Lu Yan-ping [1 ]
Bin, Du [1 ]
机构：
[1] Beijing Vacuum Elect Res Inst, 13 Jiuxianqiao Rd, Beijing 100016, Peoples R China
来源：
2015 IEEE INTERNATIONAL VACUUM ELECTRONICS CONFERENCE (IVEC) | 2015年
关键词：
thermal contact resistance; AIN; Kovar alloy; laser flash method;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this paper, the thermal contact resistance of solid interface between AlN and Kovar alloy and some main influencing factors of it were investigated. The thermal contact resistance of the interface between AlN ceramic and Kovar alloy decreases with increasing temperature and increasing pressure respectively, and thermal contact resistance between the unpolished samples is higher than that between polished samples. A function relation between pressure P applied on the AlN ceramic and Kovar alloy interface and the thermal contact resistance R is also presented.
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页数：2
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