Behavior of Polyaniline Particles in Vacuum on Silicon and Sapphire Single-Crystal Substrates

被引：0

作者：

Vlasov, V. P. ^{[1
]}

Muslimov, A. E. ^{[1
]}

Kanevsky, V. M. ^{[1
]}

机构：

[1] Russian Acad Sci, Fed Sci Res Ctr Crystallog & Photon, Shubnikov Inst Crystallog, Moscow 117333, Russia

来源：

JOURNAL OF SURFACE INVESTIGATION | 2021年 / 15卷 / 06期

基金：

俄罗斯基础研究基金会;

关键词：

polyaniline; vacuum; sapphire; silicon microscopy; orientation; POLYMERS;

D O I：

10.1134/S1027451021060239

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

For the first time, studies of the evolution of the morphology of polyaniline (PANI) particles on the surface of silicon (111) and sapphire (0001) in ultra-high vacuum are conducted. It is established by microscopy methods that exposure to ultra-high vacuum leads to the melting of particles with their simultaneous orientation relative to the substrate surface. The possibility of obtaining continuous oriented films by holding PANI particles in vacuum is shown.

引用

页码：1200 / 1204

页数：5

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