UV-Assisted Low Temperature Oxide Dielectric Films for TFT Applications

Solution-based oxide gate dielectric layers are prepared from metal nitrates using UV-assisted annealing at 150-C. The leakage current densities of ZrO2 and Al2O3 dielectrics are less than about 10-9 A/cm2 at 1 MV/cm and comparable to those formed by annealing at higher temperatures. High dielectric constants and the low leakage current behavior of the dielectric layers provide excellent ZnO TFT performance, with a field effect mobility of 1.37 cm2/V.s and an off-current density of 10-12 A/cm2. This low fabrication temperature process is compatible with future plastic electronics technology. © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.