Raman Spectroscopy - a multi-functional analysis tool for microelectronics manufacturing

被引：3

作者：

Ballast, LK ^{[1
]}

Hossain, TZ ^{[1
]}

Campion, A ^{[1
]}

机构：

[1] Adv Micro Devices Inc, Austin, TX 78741 USA

来源：

PROCESS CONTROL AND DIAGNOSTICS | 2000年 / 4182卷

关键词：

Raman spectroscopy; thin films; defect analysis; nondestructive chemical analysis; phase transformations; contamination identification; cobalt suicide; polysilicon;

D O I：

10.1117/12.410082

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have established several applications for the use of Raman spectroscopy in the microelectronics-manufacturing environment. The two primary applications are 1) monitoring thin films and 2) analyzing contaminants. Thin film applications include monitoring cobalt silicide phase transformation and thickness, and crystallinity changes in polysilicon. The same instrument has been used to collect fingerprint Raman spectra of contaminants that can be identified by matching to library or bulk materials spectra.

引用

页码：221 / 230

页数：10

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