High volume manufacturing capability of negative tone development process

被引：16
|
作者：
Tarutani, Shinji [1 ]
Kamimura, Sou [1 ]
Fujii, Kana [1 ]
Katou, Keita [1 ]
Enomoto, Yuuichirou [1 ]
机构：
[1] FUJIFILM Corp, Elect Mat Res Labs, R&D Management Headquarters, Yoshida, Shizuoka 4210396, Japan
来源：
ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVIII | 2011年 / 7972卷
关键词：
Negative tone development process; lithography performance; defectivity; CDU;
D O I：
10.1117/12.879391
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
High volume manufacturing capability of negative tone development (NTD) process were discussed in viewpoint of lithography performance, necessary developing time impacting throughput, pattern defectivity, and CD-uniformity (CDU). Dense C/H pattern lithographic performances of the latest resist materials dedicated NTD process were introduced, and the design strategy of these resists were discussed. Best condition of development time was fixed with the study on development time dependences on CD-uniformity and defectivity. Throughput performance of NTD was discussed with the necessary development time. Pattern defectivity studies and CDU studies were carried out on L/S pattern and C/H pattern.
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页数：8
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