Modeling of Injection-dependent Non-radiative Recombination via Point and Extended Defects in mc-Si

被引:0
|
作者
Semichaevsky, Andrey [1 ]
机构
[1] Lincoln Univ, Chem & Phys, Lincoln Univ, PA 19352 USA
来源
2019 IEEE 46TH PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC) | 2019年
关键词
Dislocations; interstitials; non-radiative recombination; numerical modeling; silicon; LIFETIME; SILICON; IRON;
D O I
10.1109/pvsc40753.2019.8981185
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Non-radiative (NR) carrier recombination limits the efficiency of photovoltaic energy conversion. Minority carrier lifetimes in Si exhibit a variety of dependences on optical injection levels, depending on the types of defects present. To date, models of non-radiative recombination in silicon were proposed for point defects (e.g., Fe interstitials) and extended defects (e.g., dislocations). Direct measurement of local carrier concentration near recombination centers is technically difficult, therefore, computational modeling may be helpful to understand various carrier recombination pathways in materials such as mc-Si. In this paper, modeling is used to compare intensity-dependent NR recombination lifetimes in Si. The usefulness of the model goes beyond mc-Si photovoltaics.
引用
收藏
页码:330 / 333
页数:4
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