One-step microfabrication of fused silica by laser ablation of an organic solution

被引：224
|
作者：
Wang, J [1 ]
Niino, H [1 ]
Yabe, A [1 ]
机构：
[1] Natl Inst Mat & Chem Res, Tsukuba, Ibaraki 3058565, Japan
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1999年 / 68卷 / 01期
关键词：
D O I：
10.1007/s003390050863
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We have developed a one-step technique to fabricate a well-defined pattern of lines and spaces in fused silica with micro-sized features, using laser-induced backside wet etching (LIBWE). The etch rate ranged from 5 to 25 nm/pulse with KrF laser irradiation from 400 to 1300 mJ/cm(2) and an acetone solution containing pyrene at a concentration of 0.4 mol/dm(3). The threshold fluence was 240 mJ/cm(2), which is about one-fortieth lower than that obtained with conventional KrF laser ablation.
引用
收藏
页码：111 / 113
页数：3
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