Fabrication of Antireflection Structures as a Protective Layer of Solar Cells with Nanoporous Silica Films and Nanoimprinted Moth-Eye Structure

被引：0

作者：

Kim, K. -C. ^{[1
,2
]}

Han, J. -H. ^{[2
]}

Jang, J. -H. ^{[3
]}

Choi, C. -G. ^{[2
]}

Choi, S. -Y. ^{[2
]}

Kim, C. K. ^{[1
]}

Kye, H. -S. ^{[1
]}

Cheong, I. -S. ^{[1
]}

机构：

[1] Mokwon Univ, Dept Mat Design Engn, Taejon 302729, South Korea

[2] ETRI, Creat Res Ctr Graphene Elect, Taejon 305700, South Korea

[3] HYTC, Taejon 305510, South Korea

来源：

ACTA PHYSICA POLONICA A | 2011年 / 120卷 / 6A期

关键词：

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The antireflection structures are fabricated by sol-gel process as a protective layer of solar cells and by hot embossing process with anodized aluminum oxide membrane template on polycarbonate film. The optical properties and morphology of the antireflection structures are analyzed by UV-visible spectroscopy and field emission scanning electron microscopy, respectively. The total conversion efficiency of a polycrystalline Si solar cell module with the protective layer, sol-gel-derived nanoporous antireflection structure, is increased by 2.6% and 5.7% for one-side antireflection coated prismatic matt glass and both-side antireflection coated prismatic matt glass, respectively.

引用

页码：A47 / A49

页数：3

共 29 条

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