All-silicon multi-band TM-pass polarizer on a 220 nm SOI enabled by multiplexing grating regimes

被引:25
|
作者
Zhang, Jinsong [1 ]
Xu, Luhua [1 ,2 ]
Mao, Deng [1 ]
D'Mello, Yannick [1 ]
Li, Weijia [1 ]
Lessard, Stephane [3 ]
Plant, David, V [1 ]
机构
[1] McGill Univ, Dept Elect & Comp Engn, Photon Syst Grp, Montreal, PQ, Canada
[2] CMC Microsyst, Kingston, ON, Canada
[3] Ericsson Canada, Montreal, PQ, Canada
来源
OPTICS EXPRESS | 2022年 / 30卷 / 01期
关键词
HIGH-EXTINCTION-RATIO; BEAM SPLITTER; BROAD-BAND; SUBWAVELENGTH STRUCTURES; COMPACT; ROTATOR; COUPLERS; DESIGN;
D O I
10.1364/OE.447435
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We propose an all-silicon design of a multi-band transverse-magnetic-pass (TM-pass) polarizer. The device is based on one-dimensional gratings that work under different regimes that depend on the polarization. With a tapered structure, it is revealed that the operation bandwidth can be extended by multiplexing the diffraction in O-band and the reflection in S-, C-, and L-bands for the transverse-electric (TE) mode. By simulation, we achieve a 343 nm device bandwidth with insertion loss (IL) < 0.4 dB and polarization extinction ratio (PER) > 20 dB. The operation wavelength range covers commonly-used optical telecommunication bands including the O-, S-, C-, and L- bands. Experimental results also show IL < 1.6 dB and PER > 20 dB from 1265 nm to 1360 nm corresponding to the O-band, and from 1500 nm to 1617 nm that corresponds to the C-band. The device is a single-etched design on the standard 220 nm silicon-on-insulator (SOI) with silicon oxide cladding. Such a simple and compatible design paves the way for developing practical multi-band silicon photonic integrated circuits. (c) 2021 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement
引用
收藏
页码:326 / 335
页数:10
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